Journal Report

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

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Journal Information
Journal Title
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Publisher
AIP Publishing
ISSN
1071-1023
E-ISSN
Database
ALL DATABASES
Domain
Physical Sciences
Classification History
Year A+ A B C
2026
2025
2024
2023
2021/2022 ✓
2020 ✓
2019 ✓
2018 ✓
A journal may have more than one classification in the same year. All recorded classifications are displayed.
Recent Articles
Preface
Elizabeth Dobisz
2009-11-1 Vol. 27 Issue 6 Pages 2502-2502
DOI: 10.1116/1.3269923
Direct e-beam writing of 1nm thin carbon nanoribbons
C. T. Nottbohm, A. Turchanin, A. Beyer et al.
2009-11-1 Vol. 27 Issue 6 Pages 3059-3062
DOI: 10.1116/1.3253536
Pushing extreme ultraviolet lithography development beyond 22 nm half pitch
Patrick P. Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an et al.
2009-11-1 Vol. 27 Issue 6 Pages 2911-2915
DOI: 10.1116/1.3237092
Fabrication of nanodot array molds by using an inorganic electron-beam resist and a postexposure bake
Tetsuro Manabe, Jun Taniguchi, Kiyoshi Ishikawa
2009-11-1 Vol. 27 Issue 6 Pages 2832-2836
DOI: 10.1116/1.3253649
Evaluation of each electron beam and exposure results with four column cells in multicolumn e-beam exposure system
Akio Yamada, Hiroshi Yasuda, Masaki Yamabe
2009-11-1 Vol. 27 Issue 6 Pages 2518-2523
DOI: 10.1116/1.3253614
Application of neural network to controlling three-dimensional electron-beam exposure distribution in resist
C. Guo, S.-Y. Lee, S. H. Lee et al.
2009-11-1 Vol. 27 Issue 6 Pages 2572-2579
DOI: 10.1116/1.3259959
Development and characterization of an iodine field emission ion source for focused ion beam applications
Timothy P. Fedkiw, Paulo C. Lozano
2009-11-1 Vol. 27 Issue 6 Pages 2648-2653
DOI: 10.1116/1.3253604
Near neighbor averaging: A technique for improving image uniformity in aperture array lithography
A. Nasrullah, D. Smith, T. Sherlock et al.
2009-11-1 Vol. 27 Issue 6 Pages 2674-2678
DOI: 10.1116/1.3265462
Self-aligned fabrication of 10 nm wide asymmetric trenches for Si/SiGe heterojunction tunneling field effect transistors using nanoimprint lithography, shadow evaporation, and etching
Chao Wang, Stephen Y. Chou
2009-11-1 Vol. 27 Issue 6 Pages 2790-2794
DOI: 10.1116/1.3237138
Evaluation of nanoimprint lithography as a fabrication process of phase-shifted diffraction gratings of distributed feedback laser diodes
Masaki Yanagisawa, Yukihiro Tsuji, Hiroyuki Yoshinaga et al.
2009-11-1 Vol. 27 Issue 6 Pages 2776-2780
DOI: 10.1116/1.3244631
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Printed: November 13, 2026 04:28