Journal Report

Journal of Photopolymer Science and Technology

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Journal Information
Journal Title
Journal of Photopolymer Science and Technology
Publisher
Tokai University
ISSN
0914-9244
E-ISSN
1349-6336
Database
SCOPUS
Domain
Physical Sciences
Classification History
Year A+ A B C
2026 ✓ ✓
2025 ✓ ✓
2024 ✓ ✓
2023 ✓ ✓
2021/2022 ✓ ✓
2020 ✓ ✓
2019 ✓ ✓
2018 ✓
A journal may have more than one classification in the same year. All recorded classifications are displayed.
Recent Articles
Effect of Methyl Group of Terminal Phenol of Dissolution Inhibitor on Sensitivity in Chemically Amplified Three-Component Novolac Resists
Katsuaki Takashima, Hidekazu Konishi, Yuichirou Tanaka et al.
2026-7-31 Vol. 39 Issue 2 Pages 137-144
DOI: 10.2494/photopolymer.39.137
Dissolution Kinetics of Poly(4-hydroxystyrene) Film in Alcohol/water Mixture -Development Simulation of Polymer Films Using Intrinsic Viscosity and Huggins Coefficient-
Mikiko Kozawa, Yuko Tsutsui Ito, Kayoko Cho et al.
2026-7-31 Vol. 39 Issue 2 Pages 91-98
DOI: 10.2494/photopolymer.39.91
Improvement of Non-PFAS Biomass EUV Resist by Optimization of Chemical Structures
Sotaro Fukumoto, Yuki Yoshikura, Yuki Yanagisawa et al.
2026-7-31 Vol. 39 Issue 3 Pages 159-164
DOI: 10.2494/photopolymer.39.159
Moth-eye nanostructured surface with patterned superhydrophilic regions on a superhydrophobic background
Takuto Wakasa, Jun Taniguchi
2026-7-31 Vol. 39 Issue 3 Pages 189-195
DOI: 10.2494/photopolymer.39.189
Influence of Underlayer Material Parameters on Pattern Collapse in EUV Patterning
Hyeon Woo Shin, Stanfield Youngwon Lee, Jiyoung Hwang et al.
2026-7-31 Vol. 39 Issue 2 Pages 85-89
DOI: 10.2494/photopolymer.39.85
Study of the High-intensity Reflection Structure that used the Speckle Exposure Method
Atsushi Sekiguchi, Tomoki Iwaoka, Hiroshi Kobayashi et al.
2026-7-31 Vol. 39 Issue 4 Pages 263-269
DOI: 10.2494/photopolymer.39.263
Patterning Materials for Lithography: Moving in New Directions
Harry J. Levinson
2026-7-31 Vol. 39 Issue 1 Pages 29-35
DOI: 10.2494/photopolymer.39.29
Development of Reactive Molecular Dynamics for Cross-linked Polymer Networks
Minoru Hoshino, Masaru Yamasaki, Yohei Okoda et al.
2026-7-31 Vol. 39 Issue 4 Pages 277-282
DOI: 10.2494/photopolymer.39.277
Engineering the Future of EUV Lithography: A Collaborative Journey in Metal-Oxide Resist Innovation
Danilo De Simone
2026-7-31 Vol. 39 Issue 2 Pages 67-84
DOI: 10.2494/photopolymer.39.67
Observation of Crystal-to-Liquid and Liquid-to-Solid Phase Transitions of Azobenzene Crystals in Response to Light Wavelengths
Mina Han
2026-7-31 Vol. 39 Issue 4 Pages 271-275
DOI: 10.2494/photopolymer.39.271
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Printed: November 7, 2026 23:13