Journal Report

THIN SOLID FILMS

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Journal Information
Journal Title
THIN SOLID FILMS
Publisher
ELSEVIER SCIENCE SA
ISSN
0040-6090
E-ISSN
1879-2731
Database
Clarivate
Domain
Physical Sciences
Classification History
Year A+ A B C
2026 ✓ ✓
2025 ✓ ✓
2024 ✓ ✓
2023 ✓ ✓
2021/2022 ✓ ✓
2020 ✓ ✓
2019 ✓ ✓
2018 ✓
A journal may have more than one classification in the same year. All recorded classifications are displayed.
Recent Articles
Photoluminescence properties of cerium-samarium tungstates Ce(2-x)Smx(WO4)3 thin films
Amine El Halabi, Tomas Fiorido, Sylvie Villain et al.
2026-11 Vol. 853 Pages 141062
DOI: 10.1016/j.tsf.2026.141062
Frequency-modulated bias for enhanced cross section characterization of solar cells via Kelvin probe force microscopy
Yazhou Hu, Pere Roca i Cabarrocas, Wanghua Chen
2026-11 Vol. 853 Pages 141064
DOI: 10.1016/j.tsf.2026.141064
Microstructural evolution and property changes in sputter-deposited Al–C films during annealing
Injong Oh, Sunkun Choi, Hojang Kim et al.
2026-11 Vol. 853 Pages 141058
DOI: 10.1016/j.tsf.2026.141058
Physics-constrained, Kramers–Kronig-consistent retrieval of the refractive index and thickness of porous silicon thin films from multi-angle reflectance
Guido Mula
2026-11 Vol. 853 Pages 141059
DOI: 10.1016/j.tsf.2026.141059
Fabrication and characterization of polymer-gold thin films for thiamine detection applications
Malgorzata Sypniewska, Tomasz Rerek, Marek Trzcinski et al.
2026-11 Vol. 853 Pages 141065
DOI: 10.1016/j.tsf.2026.141065
Modulation of electrochemical tunnel etching of aluminum foil through sodium molybdate-based passivation pretreatment
Xuan Luo, Qisen Wang, Ning Peng
2026-11 Vol. 853 Pages 141053
DOI: 10.1016/j.tsf.2026.141053
Growth temperature-dependent phase evolution and room temperature magnetic properties of epitaxial Fe₃GaTe₂ thin films
Minh-Anh Nguyen Tran, Van Quang Nguyen, The-Long Phan et al.
2026-11 Vol. 853 Pages 141061
DOI: 10.1016/j.tsf.2026.141061
Plasma-stoichiometry-driven densification behavior and moisture transport correlation in low-temperature plasma-enhanced chemical vapor deposition SiO₂ films
Hyunseo Park, Ire Oh, Sangmin Hong et al.
2026-11 Vol. 853 Pages 141056
DOI: 10.1016/j.tsf.2026.141056
Structure and conductive properties of TiNx films deposited by radio frequency magnetron sputtering
Jiahao Ren, Bin Zhang, Mengqi Liu et al.
2026-11 Vol. 853 Pages 141048
DOI: 10.1016/j.tsf.2026.141048
Evaluation of SnO2:Eu3+ films for luminescent transparent conducting oxides
Pule Nche, R.E. Kroon
2026-10 Vol. 852 Pages 141051
DOI: 10.1016/j.tsf.2026.141051
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Printed: October 30, 2026 12:54