Journal Report

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

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Journal Information
Journal Title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Publisher
A V S AMER INST PHYSICS
ISSN
0734-2101
E-ISSN
1520-8559
Database
Clarivate
Domain
Physical Sciences
Classification History
Year A+ A B C
2026 ✓ ✓
2025 ✓ ✓
2024 ✓ ✓
2023 ✓ ✓
2021/2022 ✓ ✓
2020 ✓ ✓
2019 ✓ ✓
2018 ✓
A journal may have more than one classification in the same year. All recorded classifications are displayed.
Recent Articles
Atomic layer controlled electron beam induced etching of molybdenum using sequential O2 and HCl exposures with positive sample voltage
Michael A. Collings, Steven M. George
2026-11-6 Vol. 44 Issue 6
DOI: 10.1116/6.0005676
Structure and optoelectronic properties of ZnS1− <i>x</i> Se <i>x</i> films deposited by RF co-sputtering
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2026-11-6 Vol. 44 Issue 6
DOI: 10.1116/6.0005645
Impact of prebonding plasma treatment on indium
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DOI: 10.1116/6.0005875
Kinetics of chitosan plasma treatments to elucidate surface modification mechanisms
Bethany M. Yashkus, Joshua M. Blechle
2026-11-3 Vol. 44 Issue 6
DOI: 10.1116/6.0005779
Nanoscale patterning of Ru. I. Effect of plasma nitridation and hydrogen reduction
Owen Watkins, Harsono Simka, Jane P. Chang
2026-11-3 Vol. 44 Issue 6
DOI: 10.1116/6.0005827
Condition-gated graph neural networks with autoregressive training for plasma-etching profile prediction
JungHo Song, Ki-Hwan Cho, Hyunsik Kim
2026-11-3 Vol. 44 Issue 6
DOI: 10.1116/6.0005847
Nanoscale patterning of Ru. II. Anisotropy and selectivity
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2026-11-3 Vol. 44 Issue 6
DOI: 10.1116/6.0005828
Plasma-enhanced atomic layer deposition of tungsten diselenide thin films using bis( <i>tert</i> -butylimido)bis(dimethylamino)tungsten and H2Se plasma
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2026-11-2 Vol. 44 Issue 6
DOI: 10.1116/6.0005822
Epitaxial growth and resistivity of <i>θ</i> -CuAl2(001)/MgO(001) films
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DOI: 10.1116/6.0005777
Effect of laser power on the performance of <i>in situ</i> TiC enhanced Al-based composite coatings
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Printed: November 6, 2026 19:52